Low-power High-throughput Talbot Array Scanning Volumetric Lithographic System

The science and technology of structuring and miniaturization of material by lithography have been constantly advancing to develop nanoscale and single-digit-micron-scale devices revolutionizing the world with smaller and more efficient transistors, microelectromechanical systems, and metamaterial devices. However, these technologies are based on planar approaches, limiting products to two dimensions. To further this advancement, new and advanced lithographic processes are needed that can extensively pattern materials at the nano/microscale level in three-dimensions. To address this need for new, scalable, rapid, and affordable large-area lithographic approaches to nano/microfabrication in three dimensions, an innovative low-power high-throughput volumetric lithographic system is proposed. The proposed nano/microfabrication in 3D is based on a highly parallel micro-objective lens array design that utilizes a proposer-developed electrically tunable phase-matched liquid crystal microlens array and low-cost commercial off-the-shelf components. Specifically, the innovation in the use of the tunable liquid crystal microlens array and the Talbot grid scanning approach will enable the proposed system to provide a highly parallel, direct laser writing, three-dimensional lithography and overcome the limitations of current direct laser writing approaches, and to provide simultaneous (>10,000) submicron focus spots (voxels), high scan speed (>100,000 voxels/second),largeworkingdistance(>1cm),andlowwritepower(<1 mW/voxel) using a low-cost continuous-wave laser, and commercial off-the-shelf photopolymer resin sensitized for enhanced absorption and rapid polymerization. In Phase I, the feasibility of the proposed rapid low-power high-throughput Talbot array scanning volumetric lithography technology will be demonstrated by developing a design that could provide high-resolution (<1 µm), large scan field (>1 cm), large three-dimensional depth (>1 mm), volumetric structures as specified in the project goal. In Phase II, development of a prototype of a volumetric lithographic system that will meet the customer requirements, and demonstration of its capability for low-power, high-throughput volumetric lithography are planned. The proposed rapid, affordable, large-area scalable volumetric lithography approach will enable a multitude of applications ranging from micro-optics, metamaterials, subwavelength optical devices, biomedical tissue scaffolding and imaging, and other tasks unserved by planar lithography or current direct laser writing approaches.