Effect of Acid Etching Time in Ti₃C₂ MXene’s Interlayer Spacing and Conductivity

Materials with sheet-like morphologies often form interconnected networks of layers or flakes, offering continuous channels for electron and ion transport in electrochemical energy storage applications. One such material is the recently discovered class of 2-D transition metal carbides/nitrides, called MXene, whose general formula is M_n+1X_nT_x (where M = transition metal; n = 1, 2, or 3; X = carbon or nitrogen; and T_x = termination group such as –F, –OH, and/or =O). Ti₃C₂, one of the most studied MXene, can be synthesized by selectively etching the aluminum layer in Ti₃AlC₂ (also called MAX phase). The most straightforward technique to exfoliate this layer is by wet-chemical etching with high-concentration hydrofluoric acid (HF). In this study, the effect of etching time on the morphology, interlayer spacing, and electrical conductivity of the resultant MXene was studied.. Authors: Alonzo, Shanna Marie M. [North Carolina Agricultural and Technical State University, Greensboro, NC (United States); NC A&T]; Dahal, Rabin [North Carolina Agricultural and Technical State University, Greensboro, NC (United States)]; Ashie, Moses D. [North Carolina Agricultural and Technical State University, Greensboro, NC (United States)]; Bastakoti, Bishnu Prasad [North Carolina Agricultural and Technical State University, Greensboro, NC (United States)]. DOE Contract: SC0024611. Subjects: 25 ENERGY STORAGE