Dual-Wavelength Simultaneous Patterning of Degradable Thermoset Supports for One-Pot Embedded 3D Printing

Vat photopolymerization (VP) techniques have enabled the fabrication of complex geometries while balancing high precision and fast processing times. 3D printed objects are traditionally built layer-by-layer with newly cured layers being structurally supported by previous ones. Fabricating unsupported features such as overhangs and arches risks misalignment and sagging, limiting the range of accessible designs. To overcome this issue, support structures are fabricated along with the primary object as temporary scaffolds that provide stability and conserve print fidelity. For VP specifically, patterning dissolvable sacrificial supports is attractive to avoid manual removal after printing. In this study, we demonstrate a base-degradable thermoset to pattern print supports in a one-pot formulation along with the primary structural material. Efficient printing is enabled using a dual-wavelength negative imaging (DWNI) DLP printer that patterns the degradable thermoset with visible light and the permanent network with UV light, which are simultaneously projected using a single digital micromirror device (DMD). Printed objects undergo thermal postprocessing to enhance the final conversion of the primary material, after which thermoset supports are degraded in a basic, aqueous solution. This approach provides a robust method for the dual-wavelength patterning of sacrificial thermoset supports, broadening the range of accessible 3D printable materials and geometries.. Authors: Arias Ponce, Isabel [Univ. of California, Santa Barbara, CA (United States); Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]; Moran, Bryan [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]; Hawker, Craig J. [Univ. of California, Santa Barbara, CA (United States)] (ORCID:000000019951851X); Shusteff, Maxim [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)]; Huang, Sijia [Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States); Univ. of Utah, Salt Lake City, UT (United States)] (ORCID:0009000590455811). DOE Contract: AC52-07NA27344. Subjects: 3D printing; degradation; electromagnetic radiation; organic polymers; quantum mechanics